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Influence of a Continuous Activation Energy Spectrum on the Aging Behavior of Magnetic Thin Films

机译:连续活化能谱对磁性薄膜老化行为的影响

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摘要

Skew aging and its dependence on stabilization treatments have been investigated in cylindrical electroplated Permalloy films by annealing in hard‐axis magnetic fields. The skew field Hβ was measured using the Belson test method. Plots of Hβ vs a logarithmic time scale show nearly straight lines over a range of four decades for temperatures between the ambient temperature and 200°C. This behavior may be explained by assuming that the activation energies of the relaxation processes have a continuous distribution between 0.8 and 1.6 eV, independent of the stabilization treatment. The frequency factor is found to be a function of the stabilization temperature, lying between 109 and 1010 sec-1. These values can be interpreted as being due to first‐order kinetic processes, which is not possible if discrete activation energies are assumed. The reason for the distribution is the highly defected structure of thin films, especially at grain boundaries and dislocations and around impurities. Stabilization treatments reduce the total volume of these regions and the vacancy concentration. Only the FeFe pair ordering mechanism is necessary to interpret the annealing data if one assumes that pairs in local defected regions also contribute to the anisotropy.
机译:通过在硬轴磁场中进行退火,研究了圆柱形电镀坡莫合金膜的偏斜时效及其对稳定化处理的依赖性。偏场Hβ使用贝尔森测试方法测量。对于环境温度和200°C之间的温度,Hβ与对数时间标度的关系图显示了四十年范围内的几乎直线。可以通过假设松弛过程的活化能具有介于0.8和1.6 eV之间的连续分布而与稳定化处理无关的方式来解释此行为。发现频率因子是稳定温度的函数,介于109和1010 sec-1之间。这些值可以解释为是由于一级动力学过程造成的,如果假设离散的活化能是不可能的。分布的原因是薄膜的高缺陷结构,特别是在晶界和位错以及杂质周围。稳定化处理可减少这些区域的总体积和空位浓度。如果人们假设局部缺陷区域中的金属对也有助于各向异性,则仅需FeFe对排序机制即可解释退火数据。

著录项

  • 来源
    《Journal of Applied Physics 》 |1971年第3期| 共5页
  • 作者

    Pfrenger Eberhard;

  • 作者单位

    Zentrallaboratorium f&xfcr;

    Nachrichtentechnik der Siemens A.G., M&xfnch;

    en, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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