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首页> 外文期刊>Journal of Applied Physics >Phototunnel conductance effect in GaAs p‐n and MIS junctions
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Phototunnel conductance effect in GaAs p‐n and MIS junctions

机译:GaAs p-n和MIS结中的光隧道电导效应

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摘要

p‐n tunnel junctions made by alloying and MIS tunnel junctions made by contacting the metal were fabricated using degenerate n‐type GaAs substrates. The conductance G and capacitance C of these diodes have large sensitivity to light irradiation and show similar spectra with respect to photon energy. The relative variation of photoconductance with initial dark conductance, ΔG/Gd, is more than ten times that of the photocapacitance, ΔC/Cd. It was found that the quenching light effect is observed in p‐n tunnel junctions but not in MIS tunnel junctions. These phenomena are explained by considering the change of trapped charge in the deep level due to illumination which induces a change of the depletion layer structure and the tunneling probability, resulting in the changes of C and G (phototunnel conductance). The experimental results have been shown to agree well with theoretical calculations.
机译:合金化的p-n隧道结和金属接触的MIS隧道结是用简并的n型GaAs衬底制造的。这些二极管的电导G和电容C对光辐照具有很大的灵敏度,并且在光子能量方面显示出相似的光谱。初始暗电导率ΔG/ Gd的光电导的相对变化是光电电容ΔC/ Cd的十倍以上。发现在p-n隧道结中观察到猝灭光效应,而在MIS隧道结中未观察到。这些现象是通过考虑由于照明引起的深层俘获电荷的变化来解释的,该变化会引起耗尽层结构的变化和隧穿概率,从而导致C和G(光隧道电导)的变化。实验结果表明与理论计算吻合良好。

著录项

  • 来源
    《Journal of Applied Physics》 |1973年第10期|共9页
  • 作者

    Nishizawa Junamp;

  • 作者单位

    Research Institute of Electrical Communication, Tohoku University, Sendai, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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