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Phase-shift effect in capacitively coupled plasmas with two radio frequency or very high frequency sources

机译:具有两个射频或超高频源的电容耦合等离子体中的相移效应

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摘要

A two-dimensional fluid model was built to study the argon discharge in a capacitively coupled plasma reactor and the full set of Maxwell equations is included in the model to understand the electromagnetic effect in the capacitive discharge. Two electrical sources are applied to the top and bottom electrodes in our simulations and the phase-shift effect is focused on. We distinguish the difference of the phase-shift effect on the plasma uniformity in the traditional radio frequency discharge and in the very high frequency discharge where the standing wave effect dominates. It is found that in the discharges with frequency 13.56 MHz, the control of phase difference can less the influence of the electrostatic edge effect, and it gets the best radial uniformity of plasma density at the phase difference π. But in the very high frequency discharges, the standing wave effect plays an important role. The standing wave effect can be counteracted at the phase difference 0, and be enhanced at the phase difference π. The standing wave effect and the edge effect are balanced at some phase-shift value between 0 and π, which is determined by discharge parameters.
机译:建立了二维流体模型来研究电容耦合等离子体反应器中的氩气放电,该模型中包括全套麦克斯韦方程组,以了解电容放电中的电磁效应。在我们的模拟中,两个电源分别应用于顶部和底部电极,并且重点研究了相移效应。我们区分了相移效应对传统射频放电和驻波效应起主要作用的非常高频率放电的等离子体均匀性的影响。可以发现,在频率为13.56 MHz的放电中,控制相差可以减小静电边缘效应的影响,并且在相差π处可以获得最佳的等离子体密度径向均匀性。但是在非常高的频率放电中,驻波效应起着重要的作用。可以在相位差0处抵消驻波效应,并在相位差π处增强驻波效应。驻波效应和边缘效应在0到π之间的某个相移值(由放电参数确定)之间达到平衡。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第4期|P.043308-043308-6|共6页
  • 作者单位

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116023, People’s Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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