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首页> 外文期刊>Journal of Applied Physics >Crystallization and properties of PbO-doped Ba0.7Sr0.3TiO3 films
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Crystallization and properties of PbO-doped Ba0.7Sr0.3TiO3 films

机译:掺PbO的Ba0.7Sr0.3TiO3薄膜的晶化和性能

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摘要

Ferroelectric Ba0.7Sr0.3TiO3 films were fabricated using a PbO-doped barium strontium titanate sol-gel precursor. Ba0.7Sr0.3TiO3 thin films with 0, 10, 20, and 30 at.%PbO doping were deposited on bare silicon, and platinum coated silicon substrates, using spin coating. The influence of PbO doping both on the film microstructure and properties was studied. Doping in excess of 20 at.%PbO was found to markedly decrease film porosity, while enhancing crystallization by decreasing the annealing temperature required for the formation of the perovskite phase from above 650 degreesC to 500 degreesC. Electrical characterization of the films demonstrated their excellent properties for electronic device application. Films with 20 at.%PbO doping had room temperature dielectric constant and dissipation factor of 268 and 0.95%, respectively (measured at 10 kHz), with tunability from 30% to 75% and commutation quality factor in excess of 10(5) (for bias field from 200 to 800 kV/cm). Room temperature leakage current were measured to be as low as 2.45x10(-9) A/cm(2) (at bias field of 250 kV/cm). (C) 2004 American Institute of Physics.
机译:铁电Ba0.7Sr0.3TiO3薄膜是使用PbO掺杂的钛酸锶锶钡溶胶-凝胶前体制成的。使用旋涂将具有0、10、20和30 at。%的PbO掺杂的Ba0.7Sr0.3TiO3薄膜沉积在裸硅和铂涂覆的硅基板上。研究了PbO掺杂对薄膜微结构和性能的影响。发现掺杂超过20原子%的PbO可显着降低膜的孔隙率,同时通过将形成钙钛矿相所需的退火温度从650℃以上降低至500℃来增强结晶。薄膜的电学表征证明了其在电子设备应用中的优异性能。掺杂20 at。%PbO的薄膜的室温介电常数和耗散系数分别为268和0.95%(在10 kHz下测量),可调性从30%到75%,换向品质因数超过10(5)(对于200至800 kV / cm的偏置场)。室温泄漏电流测得低至2.45x10(-9)A / cm(2)(在250 kV / cm的偏置电场下)。 (C)2004美国物理研究所。

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