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Time evolution of electron energy distribution function and plasma parameters in pulsed and unbalanced magnetron argon discharge

机译:脉冲和不平衡磁控氩放电中电子能量分布函数和等离子体参数的时间演化

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摘要

The temporal behavior of the electron energy distribution function and plasma parameters in the vicinity of the substrate have been investigated in detail by performing time-resolved probe measurements in a pulsed and unbalanced magnetron argon discharge. A 20-kHz midfrequency unipolar dc pulse with an on-time average power of 160 W and a duty cycle of 50% was applied to the metallic cathode target. It was found that the high-energy electrons with energies higher than the sheath potential energy are generated within a few microseconds after the dc pulse is turned on and the electron energy distribution functions during the pulse-on period show a bi-Maxwellian distribution with the high-energy electron group. In the afterglow after the dc pulse is turned off, the initial fast decay of the high-energy electrons and the subsequent diffusive slower decay of the low-energy electrons were observed. This temporal behavior of the electron energy distribution function reflected two-fold decay characteristics of electron density and electron temperature when approximated by a biexponential function with two characteristic decay times and an initial fast decay time of less than a few microseconds and a subsequent slower decay time of few tens of microseconds were observed. The temporal behavior of the other plasma parameters were presented and these results were explained in view of electron heating by deeply penetrating the high-voltage cathode sheath and electron transport.
机译:通过在脉冲和不平衡磁控氩气放电中执行时间分辨的探针测量,已经详细研究了衬底附近电子能量分布函数和等离子体参数的时间行为。将具有160 W导通时间平均功率和50%占空比的20 kHz中频单极dc脉冲施加到金属阴极靶。已经发现,在直流脉冲开启后的几微秒内,产生了比鞘层势能高的能量的高能电子,脉冲开启期间的电子能量分布函数显示出双麦克斯韦分布,且高能电子基团。在直流脉冲关闭后的余辉中,观察到高能电子的初始快速衰减和随后的低能电子的扩散较慢的衰减。当用具有两个特征衰减时间和小于几微秒的初始快速衰减时间以及随后较慢的衰减时间的双指数函数近似时,电子能量分布函数的这种时间行为反映了电子密度和电子温度的两倍衰减特性。观察到几十微秒。介绍了其他等离子体参数的时间行为,并通过深入穿透高压阴极鞘层和电子传输,对电子加热进行了解释。

著录项

  • 来源
    《Journal of Applied Physics》 |2005年第4期|p.043301.1-043301.7|共7页
  • 作者单位

    Low-Temperature Plasma Laboratory, Department of Physics, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon, 305-701, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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