Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques

摘要

We propose a design of phase mask for a single-exposure fabrication of microsphere-type photonic crystals by means of holographic lithography. The photonic crystal could have body-centered tetragonal, body-centered cubic, face-centered cubic, or face-centered tetragonal symmetry. Detailed band-gap calculations elucidate effects of macroscopic and microscopic structural parameters on the formation of photonic full band gaps.