首页> 外国专利> Method for patterning of hemispherical photonic crystallines and fabrication of photonic crystals with various shapes using photocurable colloidal suspensions

Method for patterning of hemispherical photonic crystallines and fabrication of photonic crystals with various shapes using photocurable colloidal suspensions

机译:使用光固化胶体悬浮液对半球形光子晶体进行构图的方法以及制造各种形状的光子晶体的方法

摘要

PURPOSE: A method for patterning of hemispherical photonic crystals using a colloidal dispersing agent and a manufacturing method of photonic crystals are provided to produce a large amount of the photonic crystals conveniently. CONSTITUTION: A method for manufacturing colloidal photonic crystals includes a step for injecting colloidal particles of 150~100,000nm size contained in a monomer solution to a UV curing macromolecular solution, and a step for forming colloidal photonic crystals by irradiating UV on a dispersing medium introduced to a mold frame. A manufacturing method of porous photonic crystal includes the following steps of: injecting a colloidal particle of 150~100,000nm size dispersed in a UV curing macromolecular solution to the mold frame; forming colloidal photonic crystal by irradiating UV to the dispersing medium; and removing colloid from the colloidal photonic crystal selectively.
机译:目的:提供一种使用胶态分散剂对半球形光子晶体进行构图的方法和一种光子晶体的制造方法,以方便地生产大量的光子晶体。组成:一种制造胶体光子晶体的方法,包括将单体溶液中包含的150〜100,000nm大小的胶体颗粒注入到UV固化大分子溶液中的步骤,以及通过在引入的分散介质上照射UV来形成胶体光子晶体的步骤。到模具架。多孔光子晶体的制造方法包括以下步骤:将分散在UV固化大分子溶液中的150〜100,000nm大小的胶体颗粒注入到模具框架中。通过向分散介质照射紫外线形成胶体光子晶体。选择性地从胶体光子晶体中除去胶体。

著录项

  • 公开/公告号KR100975658B1

    专利类型

  • 公开/公告日2010-08-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090097948

  • 发明设计人 양승만;김신현;임종민;정웅찬;

    申请日2009-10-14

  • 分类号B01J13;G02B1/02;

  • 国家 KR

  • 入库时间 2022-08-21 18:30:54

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