Controllable fabrication of two-dimensional compound photonic crystals by single-exposure holographic lithography

摘要

We demonstrate an approach of single-exposure holographic lithography for controllable fabrication of largescale two-dimensional square and hexagonal compound photonic crystals. In the sublattices, both circular and elliptical micropores on a 100 nm scale can be achieved. Theoretical analysis reveals that the inverse structure of a sample possesses a unique complete photonic bandgap pair in high frequency regions. This method is very robust for the general fabrication of complex periodic microstructures on the optical scale.