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首页> 外文期刊>Journal of Applied Physics >Dielectric and tunable properties of K-doped Ba_(0.6)Sr_(0.4)TiO_3 thin films fabricated by sol-gel method
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Dielectric and tunable properties of K-doped Ba_(0.6)Sr_(0.4)TiO_3 thin films fabricated by sol-gel method

机译:溶胶-凝胶法制备掺K的Ba_(0.6)Sr_(0.4)TiO_3薄膜的介电和可调特性

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Ba_(0.6)Sr_(0.4)TiO_3 (BST) thin films doped by K (BSTK) from 1 to 20 mol% were fabricated by sol-gel method on a Pt/TiO_2/SiO_2/Si substrate. Thermal evolutionary process of the Ba_(0.6)Sr_(0.4)TiO_3 and (Ba_(0.6)Sr_(0.4))_(0.95)K_(0.05)TiO_3 dry gel was carried out by thermogravimetry and differential thermal analysis system. The structure and surface morphology of BST thin films were investigated as functions of K concentration by x-ray diffraction and atomic force microscopy. The dielectric measurements were conducted on metal-insulator-metal capacitors at the frequency from 100 Hz to 1 MHz. The K concentration in BST thin films has a strong influence on the material properties including surface morphology and dielectric and tunable properties. The grain size, surface root-mean-square roughness, dielectric constant, dissipation factor, and tunability all increased with increasing K content up to 7.5 mol % and then decreased with increasing K content from 7.5 to 20 mol % in the BSTK thin films at 1 MHz. The effects of K doping on the microstructure and dielectric and tunable properties of Ba_(0.6)Sr_(0.4)TiO_3 thin films were analyzed. The (Ba_(0.6)Sr_(0.4))_(92.5%)K_(7.5%)TiO_3 thin film exhibited the highest dielectric constant of 1040 and the largest tunability of 73.6%. The dielectric constant, dielectric loss, and tunability of K-doped BST thin films with the optimal K content of 5 mol % were about 971, 0.023, and 69.96%, respectively. In addition, its figure of merit showed a maximum value of approximately 28.52.
机译:通过溶胶-凝胶法在Pt / TiO_2 / SiO_2 / Si基体上制备了1〜20mol%的K(BSTK)掺杂的Ba_(0.6)Sr_(0.4)TiO_3(BST)薄膜。采用热重分析和差热分析系统对Ba_(0.6)Sr_(0.4)TiO_3和(Ba_(0.6)Sr_(0.4))_(0.95)K_(0.05)TiO_3干凝胶的热演化过程进行了研究。通过X射线衍射和原子力显微镜研究了BST薄膜的结构和表面形貌与K浓度的关系。介电测量是在金属绝缘体-金属电容器上以100 Hz至1 MHz的频率进行的。 BST薄膜中的K浓度对材料性能(包括表面形态以及介电和可调性能)有很大影响。 BSTK薄膜中的晶粒尺寸,表面均方根粗糙度,介电常数,耗散系数和可调性都随着K含量的增加而增大,直至7.5 mol%;然后随着K含量从7.5%增加至20 mol%而减小。 1 MHz。分析了钾掺杂对Ba_(0.6)Sr_(0.4)TiO_3薄膜的微观结构,介电性能和可调谐性能的影响。 (Ba_(0.6)Sr_(0.4))_(92.5%)K_(7.5%)TiO_3薄膜表现出最高的介电常数1040和最大的可调性73.6%。最佳K含量为5 mol%的K掺杂BST薄膜的介电常数,介电损耗和可调性分别约为971、0.023和69.96%。此外,其品质因数显示出最大值,约为28.52。

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