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首页> 外文期刊>Journal of Applied Physics >Theoretical investigation of near gap electronic states of Si/SiGe multiple quantum wells on (001)-Si or SiGe substrates
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Theoretical investigation of near gap electronic states of Si/SiGe multiple quantum wells on (001)-Si or SiGe substrates

机译:(001)-Si或SiGe衬底上Si / SiGe多量子阱的近间隙电子态的理论研究

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摘要

We present a theoretical study of the near gap electronic states of Si/Ge based multiple quantum well systems composed of Si and Si_(1-x)Ge_x alloys coherently grown on (001)-Si or SiGe substrates. We interpret the experimental photoluminescence spectra recently reported [S. R. Sheng et al., Appl. Phys. Lett. 83, 857 (2003); 83, 2790 (2003)] in terms of direct or indirect k-space transitions. The effect of the spatial localization of the valence and conduction states is analyzed. We investigate the structures in the experiments within the tight binding renormalization method. Strain conditions, spin orbit effects, and quantum confinement are fully considered. Our calculations give an accurate description of the near gap experimental photoluminescence peaks.
机译:我们目前对基于Si / Ge的多量子阱系统的近间隙电子态进行理论研究,该系统由在(001)-Si或SiGe衬底上相干生长的Si和Si_(1-x)Ge_x合金组成。我们解释了最近报道的实验性光致发光光谱[S. R.Sheng等人,应用。物理来吧83,857(2003); 83,2790(2003)]直接或间接的k空间跃迁。分析了价态和传导态的空间局部化的影响。我们在紧密结合重归一化方法中研究了实验中的结构。充分考虑了应变条件,自旋轨道效应和量子约束。我们的计算给出了近间隙实验光致发光峰的准确描述。

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