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Electrochemical preparation of a rugate filter in silicon and its deviation from the ideal structure

机译:硅中褶状过滤器的电化学制备及其与理想结构的偏离

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Porous silicon single layers are formed by anodization of silicon in a hydrofluoric acid solution at different current densities. An accurate estimation of the etch rates and refractive indices is performed. The refractive index-depth profile of a porous silicon rugate filter (PSRF) prepared by sinusoidally modulating the current density during etch is investigated. The produced PSRF is found to have a periodic pseudo-sinusoidal variation of refractive index with depth. The sinusoidal current density waveform that was employed generates a nonideal refractive index-depth profile with an asymmetric period. It is found that this deformed refractive index profile affects the quality of the characteristic resonant peak of the rugate filter. A simple modification of the current density waveform can be implemented, which allows one to achieve a true sinusoidal refractive index-depth profile characteristic of a rugate filter. The modified current density waveform allows the generation of a PSRF with a low index contrast and a sharp resonant band. The ability of these structures to act as chemical vapor sensors is tested and compared with the existing literature. The filters exhibit a red-shift in the photonic feature upon exposure to saturated ethanol vapor. The modified signal does not impose a significant change on the filter sensitivity to ethanol vapor.
机译:通过在氢氟酸溶液中以不同的电流密度对硅进行阳极氧化来形成多孔硅单层。进行蚀刻速率和折射率的精确估计。研究了在蚀刻过程中通过正弦调制电流密度制备的多孔rugate硅酸盐滤光片(PSRF)的折射率深度分布。发现所产生的PSRF具有随深度的周期性的周期性伪正弦变化。所使用的正弦电流密度波形会生成具有不对称周期的非理想折射率深度分布。已经发现,这种变形的折射率分布影响了皱褶过滤器的特征共振峰的质量。可以对电流密度波形进行简单的修改,从而可以实现波纹滤波器的真实正弦折射率深度分布特性。修改后的电流密度波形允许生成具有低折射率对比度和尖锐共振带的PSRF。测试了这些结构用作化学蒸汽传感器的能力,并与现有文献进行了比较。滤光片在暴露于饱和乙醇蒸气后会显示出光子特征的红移。修改后的信号不会对过滤器对乙醇蒸气的敏感度产生重大影响。

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