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Germanium nanocrystal density and size effects on carrier storage and emission

机译:锗纳米晶体的密度和尺寸对载流子存储和发射的影响

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We are interested in germanium nanocrystal density and size effects on the carrier storage and emission processes. For this purpose, high frequency capacitance-voltage and current-voltage characteristics were performed for temperatures varying from 300 to 77 K. Ge nanocrystals were deposited on a silicon dioxide/p-doped silicon structure and capped with a thin amorphous silicon layer. Results evidenced an electron storage phenomenon in nanocrystals that presented two different behaviors depending on the temperature. For temperatures higher than ~140 K, the storage was mainly controlled by the nanocrystal density. At low temperatures the storage was reduced due to lowering of the tunneling barrier that resulted from a carrier quantum confinement process. Thermal activation energy of the carrier emission process was revealed as varying linearly with nanocrystal energy band gap. Activation energy was identified as a barrier height to be overcome by the emitted electrons.
机译:我们对锗纳米晶体的密度和尺寸对载流子存储和发射过程的影响感兴趣。为此,在300至77 K的温度范围内进行了高频电容-电压和电流-电压特性测试。Ge纳米晶体沉积在二氧化硅/ p掺杂的硅结构上,并覆盖有一层薄的非晶硅层。结果证明了纳米晶体中的电子存储现象,该现象根据温度表现出两种不同的行为。对于高于〜140 K的温度,存储主要受纳米晶体密度控制。在低温下,由于载流子量子限制过程导致隧穿势垒的降低,导致存储量减少。载流子发射过程的热活化能随纳米晶体能带隙线性变化。活化能被确定为要被发射的电子克服的势垒高度。

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