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首页> 外文期刊>Journal of Applied Physics >Study of metal-related deep-level defects in germanide Schottky barriers on n-type germanium
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Study of metal-related deep-level defects in germanide Schottky barriers on n-type germanium

机译:n型锗上锗化物肖特基势垒中与金属有关的深层缺陷的研究

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摘要

Deep levels have been studied in n-type germanium subjected to Co, Fe, Cu, Cr, and Pt germanidation in the temperature range between 300 and 700 ℃ by deep-level transient spectroscopy (DLTS). It is shown that most DLTS peaks can be assigned to acceptor levels of substitutional metal atoms. However, while in the case of Co, Fe, and Cu we have clear evidence of the indiffusion of the respective metals during the germanidation step, contamination with fast-diffusing Cu dominates the spectra for the Cr and Pt samples. At the same time, the occurrence of minority carrier traps during a bias pulse in forward operation is demonstrated and the interpretation of the corresponding peaks is discussed.
机译:通过深能级瞬态光谱法(DLTS)研究了在300到700℃温度范围内经受Co,Fe,Cu,Cr和Pt锗化的n型锗的深能级。结果表明,大多数DLTS峰可以分配给取代金属原子的受体能级。然而,尽管在钴,铁和铜的情况下,我们有清晰的证据表明在锗化步骤中各个金属的扩散,但快速扩散的铜的污染在Cr和Pt样品的光谱中占主导地位。同时,演示了正向操作中在偏置脉冲期间少数载流子陷阱的发生,并讨论了相应峰的解释。

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