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Performance of write-line inserted magnetic tunneling junction for low-write-current magnetic random access memory cell

机译:低写入电流磁性随机存取存储单元的写入线插入磁性隧穿结的性能

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摘要

We have developed a write-line-inserted magnetic tunneling junction (MTJ) (WLIM) for use in low-write-current magnetoresistance random access memory (MRAM). The write current of the WLIM was reduced to 0.98 mA and its thermal stability factor was 85 for a
机译:我们已经开发出一种插入写入线的磁性隧道结(MTJ)(WLIM),用于低写入电流磁阻随机存取存储器(MRAM)。 WLIM的写入电流降至0.98 mA,对于

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