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机译:铁掺杂的n型和p型4H-SiC中的深能级
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
Department of Physics, Chemistry and Biology, Linkoping University, SE-581 83 Linkoping, Sweden;
机译:深能级瞬态光谱法研究n型和p型4H-SiC外延层中的中间能级
机译:反应离子刻蚀在n型和p型4H-SiC中引起的深能级
机译:减少离子注入n型和p型4H-SiC中产生的深能级
机译:通过深度瞬时光谱研究的电子照射的N-和P型4H-SiC中的深度水平
机译:半导体结中深层杂质的电学表征:掺D的P型硅上的肖特基势垒。
机译:退火生长的n型和p型调制掺杂GaInNAs / GaAs应变量子阱结构的磁输运研究
机译:铁掺杂的n型和p型4H-SiC中的深能级