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机译:通过化学气相沉积法生长的单个GaN纳米线的场发射特性
Department of Electrical and Computer Engineering, University of British Columbia, Vancouver,British Columbia, V6T 1Z4, Canada;
Department of Electrical and Computer Engineering, University of British Columbia, Vancouver,British Columbia, V6T 1Z4, Canada;
Department of Electrical and Computer Engineering, University of Florida, Gainesville, Florida 32611, USA;
Department of Electrical and Computer Engineering, University of British Columbia, Vancouver,British Columbia, V6T 1Z4, Canada;
Department of Electrical and Computer Engineering, University of Florida, Gainesville, Florida 32611, USA;
Department of Electrical and Computer Engineering, University of British Columbia, Vancouver,British Columbia, V6T 1Z4, Canada;
机译:使用金属有机化学气相沉积法在单根n-GaN纳米线的m和r面上生长的InGaN / GaN多量子阱异质结构的不同特性
机译:基于ZnO的纳米线在GaN层上使用薄Au层生长雾化学气相沉积
机译:通过使用金属有机化学气相沉积的自催化方法在n-GaN纳米线的m面上生长的非极性InGaN量子点
机译:金属有机化学气相沉积在(1122)刻面GaN /蓝宝石模板上生长的InGaN / GaN多量子阱发光二极管的结构和光学性质
机译:化学气相沉积生长五股结构的铜纳米线及其应用研究。
机译:通过金属有机化学气相沉积法在c面GaN衬底上生长的富铝AlInN的结构特性
机译:GaN缓冲层厚度对通过金属有机化学气相沉积法生长的AlN / GaN分布布拉格反射器性能的影响
机译:有机金属化学气相沉积mg掺杂GaN外延层的磁共振研究2。杂志文章