首页> 外文期刊>Journal of Applied Physics >Charge balancing in GaN-based 2-D electron gas devices employing an additional 2-D hole gas and its influence on dynamic behaviour of GaN-based heterostructure field effect transistors
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Charge balancing in GaN-based 2-D electron gas devices employing an additional 2-D hole gas and its influence on dynamic behaviour of GaN-based heterostructure field effect transistors

机译:使用额外的2-D空穴气体的GaN基2-D电子气器件中的电荷平衡及其对GaN基异质结构场效应晶体管动态行为的影响

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摘要

GaN-based heterostructure FETs (HFETs) featuring a 2-D electron gas (2DEG) can offer very attractive device performance for power-switching applications. This performance can be assessed by evaluation of the dynamic on-resistance R_(on,dyn) vs. the breakdown voltage V_(bd). In literature, it has been shown that with a high V_(bd), R_(on,dyn) is deteriorated. The impairment of R_(on,dyn) is mainly driven by electron injection into surface, barrier, and buffer traps. Electron injection itself depends on the electric field which typically peaks at the gate edge towards the drain. A concept suitable to circumvent this issue is the charge-balancing concept which employs a 2-D hole gas (2DHG) on top of the 2DEG allowing for the electric field peak to be suppressed. Furthermore, the 2DEG concentration in the active channel cannot decrease by a change of the surface potential. Hence, beside an improvement in breakdown voltage, also an improvement in dynamic behaviour can be expected. Whereas the first aspect has already been demonstrated, the second one has not been under investigation so far. Hence, in this report, the effect of charge-balancing is discussed and its impact on the dynamic characteristics of HFETs is evaluated. It will be shown that with appropriate device design, the dynamic behaviour of HFETs can be improved by inserting an additional 2DHG.
机译:具有二维电子气(2DEG)的基于GaN的异质结构FET(HFET)可以为电源开关应用提供非常吸引人的器件性能。该性能可以通过评估动态导通电阻R_(on,dyn)与击穿电压V_(bd)的关系来评估。在文献中,已经表明,随着高的V_(bd),R_(on,dyn)劣化。 R_(on,dyn)的损伤主要是由电子注入到表面陷阱,势垒陷阱和缓冲陷阱中引起的。电子注入本身取决于电场,该电场通常在朝向漏极的栅极边缘处达到峰值。一种适合于解决此问题的概念是电荷平衡概念,该电荷平衡概念在2DEG的顶部采用2-D空穴气体(2DHG),可以抑制电场峰值。此外,有效沟道中的2DEG浓度不能通过表面电势的变化而降低。因此,除了击穿电压的改善之外,还可以期待动态性能的改善。尽管第一个方面已经得到证明,但是第二个方面到目前为止尚未进行调查。因此,在本报告中,讨论了电荷平衡的影响,并评估了其对HFET动态特性的影响。结果表明,通过适当的器件设计,可以通过插入额外的2DHG来改善HFET的动态性能。

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  • 来源
    《Journal of Applied Physics》 |2015年第10期|104508.1-104508.8|共8页
  • 作者单位

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

    Fraunhofer Institute of Applied Solid State Physics, 79108 Freiburg, Germany;

    Fraunhofer Institute of Applied Solid State Physics, 79108 Freiburg, Germany;

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

    GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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