首页> 外文期刊>Journal of Applied Physics >Effect of in homogeneous mesoporosity and defects on the luminescent properties of slanted silicon nanowires prepared by facile metal-assisted chemical etching
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Effect of in homogeneous mesoporosity and defects on the luminescent properties of slanted silicon nanowires prepared by facile metal-assisted chemical etching

机译:均质介孔和缺陷对通过便捷金属辅助化学刻蚀制备的倾斜硅纳米线发光性能的影响

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摘要

Slanted silicon nanowires show an improved optical absorption and better electrical contact than the vertical silicon nanowires. High aspect ratio mesoporous slanted silicon nanowires oriented along the (100) direction are fabricated by a facile two-step metal-assisted chemical etching process. Inhomogeneous porosity with a pore diameter of 2-10 nm is identified by the analysis of transmission electron microscopy, angle dependent Raman spectroscopy, and Brunauer-Emmett-Teller measurements. Slanted silicon nanowires possess a core/shell structure, and the porosity varies from top to bottom of the slanted silicon nanowires. The presence of neutral oxygen defects, self-trapped excitons, and surface defects is identified by photoluminescence spectroscopy, and the results are correlated with Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy data. In addition to mesoporosity, defects such as self-trapped excitons, oxygen vacancies, and surface defects on Si/SiOx interface contribute to the luminescence of slanted silicon nanowires. Red shift in the photoluminescence with increasing etching time is explained using quantum confinement luminescent center model. Understanding the role of defects and porosity in slanted silicon nanowires is highly desirable to increase the efficiency of silicon nanowires based optoelectronic devices. Published by AIP Publishing.
机译:倾斜的硅纳米线显示出​​比垂直硅纳米线更好的光吸收和更好的电接触。沿(100)方向取向的高纵横比介孔倾斜硅纳米线是通过便捷的两步金属辅助化学蚀刻工艺制成的。通过透射电子显微镜,角度相关拉曼光谱和Brunauer-Emmett-Teller测量的分析,可以识别出孔径为2-10 nm的不均匀孔隙。倾斜的硅纳米线具有核/壳结构,并且孔隙率从倾斜的硅纳米线的顶部到底部变化。通过光致发光光谱法鉴定中性氧缺陷,自陷激子和表面缺陷的存在,并将结果与​​傅里叶变换红外光谱和X射线光电子能谱数据相关。除了介孔性,诸如自陷激子,氧空位和Si / SiOx界面上的表面缺陷之类的缺陷也有助于倾斜的硅纳米线的发光。使用量子限制发光中心模型解释了随着刻蚀时间的增加,光致发光中的红移。为了提高基于硅纳米线的光电器件的效率,非常需要了解倾斜的硅纳米线中的缺陷和孔隙率的作用。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics》 |2018年第10期|104303.1-104303.11|共11页
  • 作者单位

    Natl Aerosp Labs, CSIR, Surface Engn Div, Nanomat Res Lab, Post Bag 1779, Bangalore 560017, Karnataka, India;

    Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India;

    Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India;

    Natl Aerosp Labs, CSIR, Surface Engn Div, Nanomat Res Lab, Post Bag 1779, Bangalore 560017, Karnataka, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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