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首页> 外文期刊>Japanese journal of applied physics >Fluorescence imprint alignment using additive-type inclination moire fringes
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Fluorescence imprint alignment using additive-type inclination moire fringes

机译:使用添加剂型倾斜莫尔纹的荧光印记对准

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It was studied whether additive-type fluorescence inclination moire fringes were observed during imprint alignment by fluorescence microscopy using a pair of two periodical concave-line patterns with a long and short pitch of p(1) and p(2) prepared on silica mold and silicon substrate surfaces without any optically functional layer. A fluorescent liquid was sandwiched between the surfaces to fill into the concave lines and excited by exposure to visible light of 530-538 nm. In the detection wavelength range of 570-700 nm, additive-type fluorescence inclination moire fringes generated from the place where bright concave lines with p(1) on the substrate were overlaid with bright concave lines with p(2) on the mold. The relationship of the mold-substrate angle deviation (theta) with the angle deviation (Psi) of an additive-type inclination moire fringe was equal to the correlation of. with the angle deviation (phi) of a multiplicative-type inclination moire fringe. (C) 2020 The Japan Society of Applied Physics
机译:研究了在通过在二氧化硅模具上制备的长且短的P(2)的一对两个周期性凹入线图案,通过荧光显微镜通过荧光显微镜观察到添加剂型荧光倾角莫尔纹凸形折痕。硅衬底表面没有任何光学功能层。荧光液体夹在表面之间以填充到凹线中并通过暴露于530-538nm的可见光激发。在570-700nm的检测波长范围内,从基板上的P(1)的明亮凹入线的位置产生的添加剂型荧光倾斜莫尔条纹覆盖在模具上的P(2)上的明亮凹线。模具 - 基板角偏差(θ)与添加剂型倾斜莫尔条纹的角度偏差(psi)的关系等于。具有乘法型倾斜莫尔条纹的角度偏差(PHI)。 (c)2020日本应用物理学会

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  • 来源
    《Japanese journal of applied physics 》 |2020年第2020期| SIIJ04.1-SIIJ04.7| 共7页
  • 作者单位

    Tohoku Univ IMRAM Aoba Ku 2-1-1 Katahira Sendai Miyagi 9808577 Japan;

    Tohoku Univ IMRAM Aoba Ku 2-1-1 Katahira Sendai Miyagi 9808577 Japan;

    Tohoku Univ IMRAM Aoba Ku 2-1-1 Katahira Sendai Miyagi 9808577 Japan;

    Tohoku Univ IMRAM Aoba Ku 2-1-1 Katahira Sendai Miyagi 9808577 Japan;

    Tohoku Univ IMRAM Aoba Ku 2-1-1 Katahira Sendai Miyagi 9808577 Japan;

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