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Rapid progression and subsequent saturation of polarization-type potential-induced degradation of n-type front-emitter crystalline-silicon photovoltaic modules

机译:极化型电位诱导的n型前发射极晶体硅光伏组件的快速发展及其随后的饱和

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In this study, we investigated progression of potential-induced degradation (PID) in photovoltaic modules fabricated from n-type-based crystalline-silicon cells with front p(+) emitters. In PID tests in which a bias of -1000 V was applied to the modules, they started to degrade within 5 s and their degradation saturated within 60s. This behavior suggested that the PID was caused by positive charge accumulation in the front passivation films. Performing PID tests with a bias of -1500 V revealed that the degradation rate strongly depended on the applied bias whereas the saturation value was independent of the applied bias. Regeneration tests on degraded modules previously subjected to PID tests for durations of 5 and 10 min were performed by applying a positive bias of +1000V. All the degraded modules completely recovered their performance losses within 60s regardless of the degradation test duration. On the basis of these results, we proposed that these positive charges originate from positively charged K centers formed by extracting electrons from neutral and negatively charged K centers. This model readily explains the observed degradation and regeneration behavior. To test our model, we determined the fixed positive charge densities (Q(f)) of a silicon nitride passivation film before and after PID, for which it was found that Q(f) showed similar saturation behavior. Additionally, the saturated Q(f) value was of the same order as K center density. These results support our model involving a charging process of K centers. (C) 2018 The Japan Society of Applied Physics
机译:在这项研究中,我们调查了由具有前p(+)发射极的基于n型的晶体硅电池制造的光伏模块中的电位诱导降解(PID)的进展。在对模块施加-1000 V偏压的PID测试中,它们在5 s内开始退化,而退化在60 s内饱和。此行为表明PID是由正面钝化膜中的正电荷积累引起的。在-1500 V的偏压下执行PID测试显示,劣化率很大程度上取决于所施加的偏压,而饱和度值与所施加的偏压无关。通过施加+ 1000V的正偏压,对经过5至10分钟持续时间的PID测试的退化模块进行再生测试。无论退化测试持续时间如何,所有退化的模块均可在60s内完全恢复其性能损失。基于这些结果,我们提出这些正电荷源自通过从中性和负电荷K中心提取电子而形成的正电荷K中心。该模型很容易解释观察到的降解和再生行为。为了测试我们的模型,我们确定了PID之前和之后的氮化硅钝化膜的固定正电荷密度(Q(f)),为此发现Q(f)表现出相似的饱和行为。另外,饱和Q(f)值与K中心密度相同数量级。这些结果支持了我们涉及K个中心收费过程的模型。 (C)2018日本应用物理学会

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