Interdiffused Layers in Antiferromagnetically Coupled Fe/Si Multilayers Studied by Soft-X-Ray Fluorescence Spectroscopy

摘要

We measured the Si L_(2,3) fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe silicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe silicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi_2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.