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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Fabrication and Anisotropic Transport Properties of (Hg, Re)Ba_2CaCU_2O_y Epitaxial Thin Films on Vicinal Substrates with Buffer Layers
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Fabrication and Anisotropic Transport Properties of (Hg, Re)Ba_2CaCU_2O_y Epitaxial Thin Films on Vicinal Substrates with Buffer Layers

机译:(Hg,Re)Ba_2CaCU_2O_y外延薄膜在具有缓冲层的邻近基底上的制备及各向异性传输性能

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摘要

Approximately 160-nm-thick (Hg_(0.9)Re_(0.1))Ba_2CaCu_2O_y ((Hg, Re)-1212) thin films were fabricated on SrTiO_3 (STO) vicinal substrates with the tilt angle of 5-18.4°. By employing Y_(0.9)La_(0.2)Ba_(1.9)Cu_3O_y, or Pr_(1.4)Ba_(1.6)Cu_3O_y thin films as buffer layers on the STO vicinal substrates, single-phase (Hg,Re)-1212 films with the c-axis normal to STO (001) and a Tc of 115-117 K were successfully grown for all the tilt angles. It was confirmed that the crystallinity of the vicinal films was comparable to that for conventional films on STO (001) substrates. The c-axis resistivity estimated from their anisotropic transport properties clearly exhibited semiconductor-like behavior below 180 K, which is similar to the case for optimally-doped Bi_2Sr_2CaCu_2O_y (Bi-2212), though the resistivity anisotropy of approximately 1000 is about one order of magnitude smaller than that of Bi-2212. Moreover, multiple branch structures characteristic of intrinsic Josephson junctions were observed in the current-voltage curves in the direction across their a-b planes.
机译:在SrTiO_3(STO)邻近基板上以5-18.4°的倾斜角制作了厚约160 nm的(Hg_(0.9)Re_(0.1))Ba_2CaCu_2O_y((Hg,Re)-1212)薄膜。通过在STO相邻基板上采用Y_(0.9)La_(0.2)Ba_(1.9)Cu_3O_y或Pr_(1.4)Ba_(1.6)Cu_3O_y薄膜作为缓冲层,可以制备单相(Hg,Re)-1212薄膜在所有倾斜角度下,垂直于STO(001)的c轴和115-117 K的Tc均成功生长。可以确认,邻接膜的结晶度与STO(001)基板上的常规膜相当。根据各向异性传输特性估算的c轴电阻率在180 K以下明显表现出类似半导体的行为,这与最佳掺杂Bi_2Sr_2CaCu_2O_y(Bi-2212)的情况相似,尽管电阻率各向异性约为1000,约为一个数量级。幅度小于Bi-2212。此外,在电流-电压曲线中沿其a-b平面的方向观察到本征约瑟夫森结的多个分支结构特征。

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