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Effect of Heat Treatment on 1.47eV Band in CdTe Films on GaAs(100) Substrates

机译:热处理对GaAs(100)衬底上CdTe膜中1.47eV带的影响

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We performed the heat treatment of CdTe films on GaAs substrates. The effect of heat treatment on a 1.47 eV band was characterized by photoluminescence (PL) spectra. As excitation density decreases, the emission peak shift of the 1.42 eV band is estimated to be 8.5 meV. As the excitation density decreases, the decrease in the intensity of the 1.47eV band becomes faster than that of the 1.42eV band. The 1.47eV band decreases in intensity with heat treatment, while the 1.42 eV band increases in intensity. These results suggest that the origin of the 1.47 eV band is annealed by heat treatment. By comparing the changes of PL spectra with and without the 1.47eV band of CdTe films before and after heat treatment, the increase in the intensity of the 1.42eV band is considered to be related to the annealing of the origin of the 1.47eV band.
机译:我们在GaAs衬底上进行了CdTe膜的热处理。热处理对1.47 eV波段的影响通过光致发光(PL)光谱来表征。随着激发密度的降低,1.42 eV波段的发射峰位移估计为8.5 meV。随着激发密度的降低,1.47eV频段的强度下降快于1.42eV频段的强度下降。 1.47eV带的强度随热处理而降低,而1.42eV带的强度则增加。这些结果表明,通过热处理使1.47eV带的起源退火。通过比较在热处理前后有CdTe膜有和没有1.47eV带的PL光谱的变化,可以认为1.42eV带强度的增加与1.47eV带起源的退火有关。

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  • 来源
    《Japanese journal of applied physics》 |2010年第7issue1期|P.071201.1-071201.4|共4页
  • 作者单位

    Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School,215-1 Shimotai Sanbongi, Towada, Aomori 034-0001, Japan;

    rnDepartment of Electrical and Computer Engineering, Hachinohe National College of Technology,16-1 Uwanotai, Tamonoki, Hachinohe, Aomori 039-1192, Japan;

    rnDepartment of Electrical and Electronic Engineering, Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan;

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