首页> 外文期刊>大阪工業大学紀要. 理工学篇 >Molecular beam epitaxial growth of InSb/CdTe and PbTe/CdTe heterosystems using high-quality CdTe(100) films on GaAs (100) substrates
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Molecular beam epitaxial growth of InSb/CdTe and PbTe/CdTe heterosystems using high-quality CdTe(100) films on GaAs (100) substrates

机译:在GaAs(100)衬底上使用高质量CdTe(100)膜对InSb / CdTe和PbTe / CdTe异质体系进行分子束外延生长

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摘要

Molecular beam epitaxial growth of high quality CdTe films on GaAs(1OO) substrates and its application to InSb/CdTe and PbTe/CdTe are described. The target of this work is to develop novel heterojunctions applicable for mid - infrared optical devices that are integrated monolithically on GaAs(100) substrates with electrical circuitry. High - quality CdTe growth on GaAs substrates is the essential technology for this purpose. However, CdTe films on GaAs have been known to include misoriented domains and structural defects due to the presence of large lattice mismatch. It is shown in this report that the use of a sulfur - treated GaAs substrate is effective in eliminating the misorientation, and the crystalline quality of these single - domain CdTe films is further improved by an annealing technique combined with MnTe capping. High - quality CdTe overgrowth at low temperatures is also found probable on the annealed MnTe/CdTe films by using a (CdTe){sub}m(MnTe){sub}n superlattice as a buffer layer. Heterojunctions of InSb/CdTe and PbTe/CdTe are successfully grown on GaAs(100) substrates using high - quality CdTe films.
机译:描述了在GaAs(100)衬底上高质量CdTe薄膜的分子束外延生长及其在InSb / CdTe和PbTe / CdTe中的应用。这项工作的目标是开发适用于中红外光学器件的新型异质结,该器件通过电路集成在GaAs(100)衬底上。在GaAs衬底上高质量CdTe的生长是实现此目的必不可少的技术。然而,由于存在大的晶格失配,已知在GaAs上的CdTe膜包括取向错误的区域和结构缺陷。该报告表明,使用硫处理的GaAs衬底可有效消除取向错误,并且通过结合MnTe封端的退火技术进一步改善了这些单畴CdTe膜的晶体质量。通过使用(CdTe){sub} m(MnTe){sub} n超晶格作为缓冲层,还发现在退火的MnTe / CdTe薄膜上可能在低温下出现高质量的CdTe过度生长。 InSb / CdTe和PbTe / CdTe的异质结在GaAs(100)衬底上使用高质量CdTe薄膜成功生长。

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