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机译:AlN中间层对二维电子气在AlGaN / AlN / GaN异质结中的分布和迁移率的影响
Venture Business Laboratory, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan;
Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan;
Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics Chinese Academy of Sciences, 16 Dong Nan Hu Road, Changchun 130033, P. R. China;
Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan;
Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan;
Department of electrical and electronic Engineering, Mie University, 1577 Kurima-Machiya, Tsu 514-8507, Japan;
机译:外延AlN /蓝宝石模板上生长的高迁移率AlGaN / AlN / GaN异质结构的纳米结构表征和二维电子气性质
机译:浮栅结构对AlGaN / AlN / GaN异质结构场效应晶体管中二维电子气体密度和电子迁移率的影响
机译:AlN中间层对在邻近衬底上生长的N极AlGaN / GaN金属-绝缘体-半导体-高电子迁移率晶体管的各向异性电子迁移率和器件特性的影响
机译:具有纳米AlN中间层的高电子迁移率AlGaN / AlN / GaN HEMT结构
机译:热,应变和中子辐照对AlGaN / GaN高电子迁移率晶体管和GaN肖特基二极管中缺陷形成的影响
机译:栅极长度与漏极-源极距离之比对AlGaN / AlN / GaN异质结构场效应晶体管中电子迁移率的影响
机译:高质量AlGaN / AlN / GaN和AlInN / AlN / GaN二维电子气异质结构的传输性能比较