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首页> 外文期刊>Japanese journal of applied physics >Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU
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Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU

机译：在新SUBARU上使用相干极紫外散射显微镜观察极紫外掩模的临界尺寸

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摘要

We have developed a coherent extreme ultraviolet scatterometry microscope (CSM) for actinic inspection and metrology of an extreme ultraviolet (EUV) mask. It was installed at the BL-3 beamline of the NewSUBARU synchrotron radiation facility. The CSM is a lens-less system with no objective, and aerial images and critical dimension (CD) values are estimated using the recorded diffraction image. A method of measuring CD values by reconstruction of aerial images using diffraction intensity has been developed. A repeatability of 0.3 nm (3
机译：我们开发了一种相干极紫外散射显微镜（CSM），用于对极紫外（EUV）掩模进行光化检查和计量。它安装在NewSUBARU同步加速器辐射设施的BL-3光束线上。 CSM是无物镜的无镜头系统，并且使用记录的衍射图像估算航空图像和临界尺寸（CD）值。已经开发出一种通过使用衍射强度来重构空中图像来测量CD值的方法。通过光化法可以实现0.3 nm（3

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  • 来源
    《Japanese journal of applied physics》 |2011年第6issue2期|p.06GB03.1-06GB03.4|共4页
  • 作者

    Tetsuo Harada; Masato Nakasuji; Masaki Tada; Yutaka Nagata; Takeo Watanabe; Hiroo Kinoshita;

  • 作者单位

    Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

    Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

    Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

    Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan,Laser Technology Laboratory, RIKEN, Wako, Saitama 351-0198, Japan;

    Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

    Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678.1205, Japan,Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

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