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首页> 外文期刊>Japanese journal of applied physics >Effect of H_2S Annealing on Sb-Doped Cu-In-S Thin Films Prepared by Vacuum Evaporation
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Effect of H_2S Annealing on Sb-Doped Cu-In-S Thin Films Prepared by Vacuum Evaporation

机译:H_2S退火对真空蒸发制备掺Sb的Cu-In-S薄膜的影响

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摘要

We investigated the effect of H_2S annealing on Sb-doped Cu-In-S thin films prepared using a vacuum evaporation method. These CuInS_2 thin films were grown successfully when annealed above 350℃ in H_2S atmosphere. It was found that the thin films were closer to stoichiometry at lower annealing temperatures compared with the undoped thin films. The carrier concentrations, resistivities and mobilities of Sb-doped thin films annealed at 400 ℃ were approximately 1 × 10~(18) cm~(-3), 30 Ωcm, and 1 cm~2 V~(-1) s~(-1) respectively.
机译:我们研究了H_2S退火对使用真空蒸发法制备的掺Sb的Cu-In-S薄膜的影响。这些CuInS_2薄膜在H_2S气氛中于350℃以上退火时成功生长。发现与未掺杂的薄膜相比,该薄膜在较低的退火温度下更接近化学计量。在400℃退火的掺Sb薄膜的载流子浓度,电阻率和迁移率分别约为1×10〜(18)cm〜(-3),30Ωcm和1 cm〜2 V〜(-1)s〜( -1)。

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  • 来源
    《Japanese journal of applied physics》 |2012年第10issue2期|10NC19.1-10NC19.3|共3页
  • 作者单位

    Department of Electrical and Computer Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan;

    Department of Electrical and Computer Engineering, Miyakonojo National College of Technology, Miyakonojo, Miyazaki 885-8567, Japan;

    Department of Electrical and Electronics Engineering, Tsuyama National College of Technology, Tsuyama, Okayama 708-8509, Japan;

    Department of Electrical and Electronics Engineering, Miyazaki University, Miyazaki 889-2192, Japan;

    Department of Electrical and Electronics Engineering, Miyazaki University, Miyazaki 889-2192, Japan;

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