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Stabilities of amorphous indium gallium zinc oxide thin films under light illumination with various wavelengths and intensities

机译:不同波长和强度的光照射下非晶铟镓锌氧化物薄膜的稳定性

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摘要

We investigated the photo responses of an amorphous indium gallium zinc oxide (a-IGZO) thin film under light illumination with various wavelengths and intensities. By using the measured photo-conductivities of a-IGZO thin films, we extracted the photo excitation activation energy and dark relaxation activation energy through extended stretched exponential analysis. The stretched exponential analysis was found to describe well both the photoexcitation and the dark-relaxation characteristics. These analyses indicated that recombination takes place more slowly and through activation processes that are more deeply bound with the broader distribution of activation energies (E_(ac)) than those corresponding to the photo-generation process. The longer wavelength of the incident light, the slower the dark-relaxation occurs because of the formation of higher E_(ac) for the ionized oxygen vacancy (V_o~(2+)) states. For the dark-relaxation process, we also observed that the stretching exponent increases and the distribution of energy levels became narrower for longer wavelengths. This suggests that the neutralization of V_o~(2+) to V_o is slower for longer wavelengths due to the higher energy barrier height (E_(ac)) for the neutralization of V_o~(2+).
机译:我们研究了无定形铟镓锌氧化物(a-IGZO)薄膜在各种波长和强度的光照下的光响应。通过使用测量的a-IGZO薄膜的光电导率,我们通过扩展的拉伸指数分析提取了光激发活化能和暗弛豫活化能。发现拉伸指数分析很好地描述了光激发和暗弛豫特性。这些分析表明,重组发生的速度较慢,并且通过的活化过程比对应于光生过程的活化能(E_(ac))的分布范围更深,与活化能的分布更为紧密。入射光的波长越长,由于电离氧空位(V_o〜(2+))形成的E_(ac)越高,暗弛缓发生越慢。对于暗松弛过程,我们还观察到,对于更长的波长,拉伸指数增加,并且能级的分布变窄。这表明,对于更长的波长,V_o〜(2+)对V_o的中和速度较慢,这是因为V_o〜(2+)的中和具有更高的能垒高度(E_(ac))。

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  • 来源
    《Japanese journal of applied physics》 |2014年第8s3期|08NG03.1-08NG03.4|共4页
  • 作者单位

    Department of Display Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea;

    Department of Display Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea;

    Department of Display Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea;

    Department of Display Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea ,Department of System Control Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea;

    Department of Display Engineering, Hoseo University, Asan, Chungnam 336-795, Republic of Korea;

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