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Characterization of intrinsic hysteresis of pentacene-based organic thin-film transistor through in-situ real-time electrical measurement

机译:通过并发实时电学测量表征并五苯有机薄膜晶体管的固有迟滞

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摘要

The intrinsic hysteresis of a pentacene-based organic thin-film transistor was characterized through home-designed in-situ real-time electrical measurement. The device exhibited intrinsic hysteresis after the device fabrication without breaking the vacuum, which has not been observed previously. Similar behavior was observed when introducing the nitrogen gas. Compared with the measurement condition of vacuum or nitrogen gas, exposure to the ambient air resulted in a severe hysteresis. It was attributed to both the acceptor-like traps at the organic/dielectric interface and the donor-like traps in the transport channel. When the chamber was vacuumed out again, a significantly reduced hysteresis was obtained almost the same as that measured just after device fabrication, indicating the reversibility of the extrinsic hysteresis. We also related the hysteresis to the morphological change under different deposition rates of pentacene. The smoother surface at higher deposition rate caused reduced hysteresis because of the elimination of vacancies near the pentacene/dielectric interface.
机译:并五苯有机薄膜晶体管的固有磁滞通过家庭设计的原位实时电学测量来表征。器件制造后,器件表现出固有的磁滞现象,而没有破坏真空,这是以前没有观察到的。当引入氮气时,观察到类似的行为。与真空或氮气的测量条件相比,暴露于环境空气中会导致严重的磁滞现象。这归因于有机/介电界面处的受体样陷阱和传输通道中的供体样陷阱。当再次将腔室抽真空时,获得的磁滞显着降低,几乎与刚制造器件后所测的磁滞相同,这表明外部磁滞具有可逆性。我们还将磁滞现象与并五苯不同沉积速率下的形态变化相关。由于消除了并五苯/介电界面附近的空位,在较高沉积速率下较光滑的表面导致磁滞减少。

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  • 来源
    《Japanese journal of applied physics》 |2014年第3s1期|03CC03.1-03CC03.6|共6页
  • 作者单位

    National Taiwan University of Science and Technology, Department of Electronic Engineering, Taipei 10607, Taiwan;

    National Taiwan University of Science and Technology, Department of Electronic Engineering, Taipei 10607, Taiwan;

    Ming Chi University of Technology, Department of Electronic Engineering, New Taipei City 24301, Taiwan;

    National Taiwan University of Science and Technology, Department of Electronic Engineering, Taipei 10607, Taiwan;

    National Taiwan University of Science and Technology, Department of Electronic Engineering, Taipei 10607, Taiwan;

    Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan;

    Ming Chi University of Technology, Department of Electronic Engineering, New Taipei City 24301, Taiwan;

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