Electrical and optical properties of compositionally spread MoInSnO thin films deposited by combinatorial RF magnetron cosputtering (vol 54, 091101, 2015)

Oh Jeung Pyo; Kim Eun Mi; Kim Young-Baek; Woo Jeong Ju; Kim Tae-Won; Heo Gi-Seok

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Electrical and optical properties of compositionally spread MoInSnO thin films deposited by combinatorial RF magnetron cosputtering (vol 54, 091101, 2015)

机译：通过组合RF磁控管共溅射沉积的成分扩散MoInSnO薄膜的电学和光学特性（vol 54，091101，2015）

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来源
《Japanese journal of applied physics》 |2015年第10期|109201.1-109201.1|共1页
作者
Oh Jeung Pyo; Kim Eun Mi; Kim Young-Baek; Woo Jeong Ju; Kim Tae-Won; Heo Gi-Seok;
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作者单位

Chonnam Natl Univ, Dept Phys, Kwangju 500757, South Korea;

Korea Inst Ind Technol, Ctr Nanophoton Convergence Technol, Gwangju 500480, South Korea;

Korea Inst Ind Technol, Ctr Nanophoton Convergence Technol, Gwangju 500480, South Korea;

Chonnam Natl Univ, Dept Phys, Kwangju 500757, South Korea;

Korea Inst Ind Technol, Ctr Nanophoton Convergence Technol, Gwangju 500480, South Korea;

Korea Inst Ind Technol, Ctr Nanophoton Convergence Technol, Gwangju 500480, South Korea;

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1. Electrical and optical properties of compositionally spread MoInSnO thin films deposited by combinatorial RF magnetron cosputtering [J] . Oh Jeung Pyo, Kim Eun Mi, Kim Young-Baek, Japanese journal of applied physics . 2015,第9期

机译：组合RF磁控管共溅射沉积的MoInSnO薄膜的电学和光学特性
2. Effects of Postdeposition Annealing on Electrical Properties of Mo-Doped Indium Oxide (IMO) Thin Films Deposited by RF Magnetron Cosputtering [J] . Naoomi YAMADA, Tsukasa TATEJIMA, Hiroki ISHIZAKI, Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2006,第42a45期

机译：沉积后退火对射频磁控共溅射沉积钼掺杂氧化铟（IMO）薄膜电学性能的影响
3. Influence of RF power on structural, morphology, electrical, composition and optical properties of Al-doped ZnO films deposited by RF magnetron sputtering [J] . Ravindra G. Waykar, Amit S. Pawbake, Rupali R. Kulkarni, Journal of materials science . 2016,第2期

机译：射频功率对射频磁控溅射沉积铝掺杂ZnO薄膜结构，形貌，电学，组成和光学性质的影响
4. Electrical and optical properties of transparent conductive Cd_3TeO_6 thin films deposited by rf magnetron sputtering [C] . H. Tetsuka, Y. J. Shan, K. Tezuka Annual Meeting of The Ceramic Society of Japan . 2005

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5. Electrical and optical properties of silver films deposited by high power impulse magnetron sputtering. [D] . Li, Jigang. 2008

机译：通过大功率脉冲磁控溅射沉积的银膜的电学和光学性质。
6. Growth of CaxCoO2 Thin Films by A Two-Stage Phase Transformation from CaO–CoO Thin Films Deposited by Rf-Magnetron Reactive Cosputtering [O] . Biplab Paul, Jun Lu, Per Eklund 2019

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7. Thickness Dependence of Microstructures and Electrical and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering [O] . 清水秀己, 大塚一毅 2017

机译：射频磁控溅射沉积ZnO薄膜的微观结构及其电学和光学性质的厚度依赖性

Electrical and optical properties of compositionally spread MoInSnO thin films deposited by combinatorial RF magnetron cosputtering (vol 54, 091101, 2015)

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