Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition

摘要

Sputtering is an important film deposition method that has been used for the fabrication of thin films used in basic research to the mass production process in factories. However, single-crystalline epitaxial platinum film has not been successfully prepared on yttria-stabilized zirconia (YSZ) (111) substrates by the sputtering method. We have deposited platinum by inductively coupled plasma-assisted sputtering on YSZ(111) with postdeposition annealing at 750-850 degrees C. As a result, single-crystalline epitaxial films with a root mean square roughness better than 0.2nm were successfully fabricated. (C) 2016 The Japan Society of Applied Physics