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Fabrication of nitrogen-containing diamond-like carbon film by filtered arc deposition as conductive hard-coating film

机译:通过过滤电弧沉积作为导电硬涂膜制备含氮类金刚石碳膜

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摘要

Diamond-like carbon (DLC) films, which are amorphous carbon films, have been used as hard-coating films for protecting the surface of mechanical parts. Nitrogen-containing DLC (N-DLC) films are expected as conductive hard-coating materials. N-DLC films are expected in applications such as protective films for contact pins, which are used in the electrical check process of integrated circuit chips. In this study, N-DLC films are prepared using the T-shaped filtered arc deposition (T-FAD) method, and film properties are investigated. Film hardness and film density decreased when the N content increased in the films because the number of graphite structures in the DLC film increased as the N content increased. These trends are similar to the results of a previous study. The electrical resistivity of N-DLC films changed from 0.26 to 8.8 Omega cm with a change in the nanoindentation hardness from 17 to 27 GPa. The N-DLC films fabricated by the T-FAD method showed high mechanical hardness and low electrical resistivity. (c) 2018 The Japan Society of Applied Physics
机译:类金刚石碳(DLC)膜是无定形碳膜,已被用作保护机械零件表面的硬涂膜。含氮的DLC(N-DLC)薄膜有望用作导电硬涂层材料。 N-DLC膜有望用于诸如接触针的保护膜之类的应用中,这些膜可用于集成电路芯片的电气检查过程。在这项研究中,使用T形过滤电弧沉积(T-FAD)方法制备N-DLC膜,并研究膜的性能。当膜中氮含量增加时,膜硬度和膜密度降低,这是因为随着氮含量的增加,DLC膜中石墨结构的数量增加。这些趋势与先前的研究结果相似。 N-DLC膜的电阻率从0.26改变为8.8Ω·cm,纳米压痕硬度从17 GPa改变为27 GPa。通过T-FAD方法制造的N-DLC膜显示出高机械硬度和低电阻率。 (c)2018年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第1s期|01AE07.1-01AE07.5|共5页
  • 作者单位

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan;

    Itoh Opt Ind Co Ltd, Gamagori, Aichi 4430041, Japan;

    Onward Ceram Coating Co Ltd, Nomi, Ishikawa 9290111, Japan;

    Onward Ceram Coating Co Ltd, Nomi, Ishikawa 9290111, Japan;

    Onward Ceram Coating Co Ltd, Nomi, Ishikawa 9290111, Japan;

    Kanagawa Ind Technol Ctr, Ebina, Kanagawa 2430435, Japan;

    Ind Technol Ctr, Okayama 7011296, Japan;

    Natl Inst Technol, Gifu Coll, Motosu, Gifu 5010495, Japan;

    Natl Inst Technol, Maizuru Coll, Maizuru, Kyoto 6258511, Japan;

    Natl Inst Technol, Tokyo Coll, Hachioji, Tokyo 1930997, Japan;

    CSIRO, Lindfield, NSW 2070, Australia;

    CSIRO, Lindfield, NSW 2070, Australia;

    CSIRO, Lindfield, NSW 2070, Australia;

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