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首页> 外文期刊>Thin Solid Films >Fabrication of diamond-like carbon film on rubber by T-shape filtered-arc-deposition under the influence of various ambient gases
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Fabrication of diamond-like carbon film on rubber by T-shape filtered-arc-deposition under the influence of various ambient gases

机译:在各种环境气体的影响下,通过T型过滤电弧沉积在橡胶上制备类金刚石碳膜

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摘要

Diamond-like carbon (DLC) films were prepared on rubber substrates using T-shape filtered-arc-deposition (T-FAD), which effectively removes the macrodroplets emitted from the graphite cathode spot from the processing plasma. In the present study, the influence of ambient gas (no gas, Ar, H_2, C_2H_2, C_2H_4, CH_4) was investigated. The DLC films adhered well to the rubber substrate. When the substrate was stretched, the small DLC islands were separated and clefs were opened. The deposition rate on rubber was approximately twice higher than that on a Si substrate. When hydrocarbon gas was introduced as an ambient gas, the deposition rate became higher than that for no gas and H_2 gas. In the cases of C_2H_4 and CH_4 gases, the DLC film was considered to contain a considerable amount of hydrogen. When C_2H_2 gas was used, the highest deposition rate with less surface roughness was achieved.
机译:使用T形过滤电弧沉积(T-FAD)在橡胶基材上制备类金刚石碳(DLC)膜,该膜可从处理等离子体中有效去除从石墨阴极点发出的大液滴。在本研究中,研究了环境气体(无气体,Ar,H_2,C_2H_2,C_2H_4,CH_4)的影响。 DLC膜很好地粘附到橡胶基材上。拉伸基材时,将小DLC岛分开并打开谱号。在橡胶上的沉积速率大约是在硅基板上的沉积速率的两倍。当将烃气作为环境气体引入时,沉积速率变得比没有气体和H_2气体的沉积速率高。在C_2H_4和CH_4气体的情况下,认为DLC膜含有大量的氢。当使用C_2H_2气体时,可获得最高的沉积速率且表面粗糙度较小。

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