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首页> 外文期刊>Japanese journal of applied physics >Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition
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Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition

机译:耐磨且导电的含氮DLC膜,该膜由采用过滤电弧沉积法制备的超薄多层组成

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摘要

Nitrogen-containing diamond-like carbon (N-DLC) multilayer films approximately 500 nm thick were fabricated on tungsten carbide substrates as surface protective films with high wear-resistive and conductive properties. Each layer thickness of the N-DLC multilayer films was approximately 10 nm, and the films were a periodic bilayer structure consisting of hard and soft N-DLC layers. Owing to the high abrasion resistance of the hard layer and the low aggressiveness and high adhesion of the soft layer, the multilayer films showed good polishing and wear resistances compared with the hard N-DLC monolayer film, and the electrical resistivity was about half. In the case of DLC multilayer films consisting of hard N-free DLC and N-DLC films, the decrease of each layer thickness leads to the reduction of the polishing resistance. From X-ray reflectivity analysis of ultrathin N-free DLC films, it was indicated that the film density of an ultra-thin N-free DLC film is lower than that of a thick N-free DLC film. In the DLC multilayer film with thin N-free DLC layers, it is possible that the polishing resistance of the whole DLC film reduced because the hardness the N-free DLC layer was decreased due to the low film density of each N-free DLC layer. (C) 2019 The Japan Society of Applied Physics
机译:在碳化钨衬底上制造约500 nm厚的含氮类金刚石碳(N-DLC)多层膜,作为具有高耐磨性和导电性的表面保护膜。 N-DLC多层膜的每层厚度约为10 nm,并且膜是由硬和软N-DLC层组成的周期性双层结构。由于硬质层的高耐磨性和软质层的低侵蚀性和高粘附性,与硬质N-DLC单层膜相比,多层膜表现出良好的抛光和耐磨性,并且电阻率约为一半。在由硬质无氮DLC和N-DLC膜组成的DLC多层膜的情况下,各层厚度的减小导致耐抛光性的降低。从超薄无氮DLC膜的X射线反射率分析可知,超薄无氮DLC膜的膜密度比厚无氮DLC膜的膜密度低。在具有薄的无N DLC层的DLC多层膜中,由于各无N DLC层的膜密度低而使无N DLC层的硬度降低,因此整个DLC膜的耐抛光性降低。 。 (C)2019日本应用物理学会

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