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DLC FILM DEPOSITION METHOD AND DLC FILM DEPOSITION APPARATUS

机译:DLC膜沉积方法和DLC膜沉积装置

摘要

PROBLEM TO BE SOLVED: To provide a DLC (Diamond Like Carbon) film deposition method and a DLC film deposition apparatus, capable of reducing the film deposition cost of a DLC by using inexpensive raw material gas.;SOLUTION: A Sabatier reaction chamber 20 is stored inside a processing chamber 3. A catalyst is stored in the Sabatier reaction chamber 20. Carbon dioxide gas and hydrogen gas is filled in the reaction part 22, and when the temperature in the reaction part 22 is high, the Sabatier reaction is executed in the reaction part 22 to generate methane gas and steam. The methane gas generated in the Sabatier reaction chamber 20 is supplied into the processing chamber 3, and used as raw material gas for DLC film deposition.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种DLC(类金刚石碳)膜沉积方法和一种DLC膜沉积设备,其能够通过使用廉价的原料气体来降低DLC的膜沉积成本。解决方案:Sabatier反应室20是储存在处理室3内的催化剂被储存在Sabatier反应室20中。二氧化碳和氢气被填充在反应部22中,并且当反应部22中的温度高时,在Sabatier反应中进行Sabatier反应。反应部分22产生甲烷气体和蒸汽。 Sabatier反应室20中产生的甲烷气体被供应到处理室3中,并用作DLC膜沉积的原料气体。版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012087330A

    专利类型

  • 公开/公告日2012-05-10

    原文格式PDF

  • 申请/专利权人 JTEKT CORP;

    申请/专利号JP20100232615

  • 发明设计人 SAITO TOSHIYUKI;SUZUKI MASAHIRO;

    申请日2010-10-15

  • 分类号C23C16/26;

  • 国家 JP

  • 入库时间 2022-08-21 17:40:19

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