首页> 外文期刊>International Journal of Heat and Mass Transfer >Effect of monolayer graphene on the performance of near-field radiative thermal rectifier between doped silicon and vanadium dioxide
【24h】

Effect of monolayer graphene on the performance of near-field radiative thermal rectifier between doped silicon and vanadium dioxide

机译:单层石墨烯对掺杂硅和二氧化钒近场辐射热整流器性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

We investigate near-field radiative thermal rectifiers (NFRTRs) comprising an asymmetric nanostructure with and without graphene coatings. The asymmetric nanostructure consists of n-type doped silicon (D-Si) and vanadium dioxide (VO_2) plates separated by a vacuum gap. On the basis of the stochastic Maxwell equations and fluctuation-dissipation theorem, we analyse the effect of graphene on the near-field radiative heat transfer (NFRHT) and the performance of the NFRTR. We find that the total thermal rectification factor (TTRF) of an NFRTR composed of n-type D-Si and VO_2 plates can be significantly enhanced by the presence of graphene, depending on the doping concentration of Si, the chemical potential value of the graphene, and the vacuum gap. When both n-type D-Si and VO_2 plates are covered by a layer of graphene, the TTRF of the NFRTR whose n-type D-Si and VO_2 plates are separated by a 10 nm vacuum gap improves from 4.38 to 7.79 for a doping concentration of 10~(19) cm~(-3) and a chemical potential of 0.25 eV. We attribute this to the strong interaction among the p-polarized surface modes of graphene-covered n-type D-Si with the doping concentration of 10~(19) cm~(-3), p-polarized surface modes of graphene-covered insulating VO_2, and p-polarized hyperbolic modes (HMs) of insulating VO_2. This work is important for near-field radiative thermal management and the application of NFRHT-based thermal devices.
机译:我们研究了包含不对称纳米结构的近场辐射热整流器(NFRTRS),其不具有石墨烯涂层。不对称纳米结构由N型掺杂的硅(D-Si)和通过真空间隙分离的二氧化钒(VO_2)板组成。在随机麦克斯韦方程和波动定理的基础上,我们分析石墨烯对近场辐射传热(NFRHT)的影响及NFRTR的性能。我们发现,由于石墨烯的存在,可以显着提高由N型D-Si和VO_2板组成的NFRTR的总热整流因子(TTRF),这取决于Si的掺杂浓度,石墨烯的化学势值和真空差距。当N型D-Si和VO_2板都被一层石墨烯覆盖时,NFRTR的TTRF透过10nm真空间隙分离,其N-型D-Si和VO_2板分离为掺杂的4.38至7.79浓度为10〜(19)厘米〜(-3)和0.25eV的化学潜力。我们将其归因于石墨烯覆盖的N型D-Si的P偏振表面模式的强相互作用,其掺杂浓度为10〜(19)cm〜(-3),P偏振表面模式的石墨烯覆盖绝缘VO_2的绝缘VO_2和P偏振双曲模式(HMS)。这项工作对于近场辐射热管理和基于NFRHT的热器件的应用非常重要。

著录项

  • 来源
    《International Journal of Heat and Mass Transfer》 |2020年第7期|119707.1-119707.11|共11页
  • 作者单位

    School of Mechanical and Electrical Engineering Guilin University of Electronic Technology No. 1 Jinji Road Guilin 541004 Cuangxi China;

    School of Mechanical and Electrical Engineering Guilin University of Electronic Technology No. 1 Jinji Road Guilin 541004 Cuangxi China;

    School of Environmental and Materials Engineering College of Engineering Shanghai Polytechnic University Shanghai 201209 China Research Center of Resource Recycling Science and Engineering Shanghai Polytechnic University Shanghai 201209 China;

    School of Environmental and Materials Engineering College of Engineering Shanghai Polytechnic University Shanghai 201209 China Research Center of Resource Recycling Science and Engineering Shanghai Polytechnic University Shanghai 201209 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Doped silicon; Graphene; Near-field radiative thermal rectifier; Surface plasmon polaritons; Thermal rectification factor;

    机译:掺杂的硅;石墨烯;近场辐射热整流器;表面等离子体极化膜;热整流因子;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号