首页> 外国专利> Method for preparation of vanadium-doped silicon carbide powder and silicon carbide powder thereby electrically insulated heat radiating filler using the same

Method for preparation of vanadium-doped silicon carbide powder and silicon carbide powder thereby electrically insulated heat radiating filler using the same

机译:制备钒掺杂的碳化硅粉末的方法以及使用该方法制备的电绝缘散热填料的碳化硅粉末

摘要

The present invention comprises the steps of (I) mixing silicon powder, carbon black powder and vanadium metal powder, followed by primary heat treatment at 1,350 to 1,800°C; (II) after the first heat treatment, a second heat treatment at 1,800 ~ 2,000 ℃; And (III) after the second heat treatment, performing a decarburization process at 600 ~ 1,000 ℃; provides a method for producing a vanadium-doped silicon carbide powder comprising a. According to the present invention, it is possible to obtain a vanadium-doped silicon carbide powder in which vanadium is uniformly distributed in a silicon carbide lattice by a direct carbonization method, and also by using a vanadium-doped silicon carbide powder obtained according to the production method of the present invention 1 By showing a high resistance value of x 10 11 Ωcm or more, it is possible to provide a heat dissipation filler that satisfies both excellent thermal conductivity and insulation.
机译:本发明包括以下步骤:(I)混合硅粉,炭黑粉和钒金属粉,然后在1,350至1,800℃下进行初步热处理; (II)第一次热处理后,在1800〜2000℃进行第二次热处理; (Ⅲ)第二次热处理后,在600〜1000℃进行脱碳过程;提供了一种制备含钒的碳化硅粉末的方法。根据本发明,可以通过直接碳化法获得钒掺杂的碳化硅粉末,其中钒通过碳化法均匀地分布在碳化硅晶格中,并且还可以通过使用根据本发明获得的钒掺杂的碳化硅粉末来获得。 [本发明的制造方法] 1通过表现出×10 11 Ωcm以上的高电阻值,可以提供兼具优异的导热性和绝缘性的散热填充剂。

著录项

  • 公开/公告号KR20200078835A

    专利类型

  • 公开/公告日2020-07-02

    原文格式PDF

  • 申请/专利权人 한국세라믹기술원;

    申请/专利号KR20180168084

  • 发明设计人 김영희;권우택;이윤주;안수빈;

    申请日2018-12-24

  • 分类号C01B32/963;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:31

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