Oriented Crystallization of Thick Pd-Ru Films during Magnetron Sputtering of Target

摘要

The possibility of obtaining thick films (3 to 7 μm) of solid solution Pd-6 wt % Ru by magnetron sputtering of a target having the corresponding composition is shown. The structure, phase composition, and surface morphology of films condensed on the surface of oxidized silicon, fluorphlogopite, and anodic aluminum oxide at 300-950 K are studied. A general trend of formation of a gradient grain structure of thick films (with a high grain dispersity level at the initial growth stage) and subsequent selective growth of grains and subgrains having an anisotropic shape and primary orientation <111> is independent of the structure and morphology of the substrate surface.