Deposition and corrosion behavior of <110>-oriented vanadium thick films by direct current magnetron sputtering

摘要

The highly oriented vanadium thick film is the ideal diffraction target of synchrotron X-ray diffraction and optical analyzer technique for investigation of phase transition at high pressure. In this study, the 110-oriented V film with thickness over 2 mu m was deposited by direct-current magnetron sputtering. The effects of working pressure (P) and target-to-substrate distance (d) on phase structure, surface morphology, microstructure, and corrosion resistance of the film were investigated. The results show that the vanadium film with the P of 1.0 Pa and the d of 70 mm is highly 110 preferred orientation. The film crystallinity decrease with the increase of P and d. As the P and d increase, the film deposition rate decreases. When the P increases from 1.0 Pa to 2.0 Pa, the corrosion resistance of the film is significantly improved, and the polarization resistance increases by an order of magnitude. However, as the pressure increases further to 2.5 Pa, the film will fall off in the corrosive medium. When the d increases, the corrosion resistance of the film will also be improved.