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首页> 外文期刊>IEICE Transactions on Electronics >Di/Ferroelectric Properties of Bismuth Based Layered Ferroelectric Films for Application to Non-Volatile Memories
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Di/Ferroelectric Properties of Bismuth Based Layered Ferroelectric Films for Application to Non-Volatile Memories

机译:铋基层状铁电薄膜的非铁电性能

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摘要

We have constructed Bi based layer structured ferroelectric films and their superlattices by a pulsed laser deposi- tion technique. The dielectric constants along c-axis increase with increasing of the number of pseudo-perovskite layers between double Bi_2O_2 layers. Ferroelectricity appears along the c-axis direction only for the odd number of the perovskite layers owing to the mirror symmetry in a crystal structure. Especially, the Bi_2VO_5.5 film shows an atomically flat surface, low dielectric constant of 30 and ferroelectricity of P_r = 3 μC/cm~2 and E_c=16 kV/cm, respectively. This material is expected to the application for FRAMs.
机译:我们通过脉冲激光沉积技术构造了Bi基层结构铁电薄膜及其超晶格。随着Bi_2O_2双层之间伪钙钛矿层数量的增加,沿c轴的介电常数增加。由于晶体结构中的镜面对称性,仅对于奇数个钙钛矿层,铁电性沿c轴方向出现。特别地,Bi_2VO_5.5膜显示出原子平面,低介电常数为30,铁电性分别为P_r =3μC/ cm〜2和E_c = 16kV / cm。该材料有望用于FRAM。

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