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Studies on laser-ablated bismuth layered ferroelectric thin films for non-volatile memory applications.

机译:用于非易失性存储应用的激光烧蚀铋层铁电薄膜的研究。

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摘要

Pulsed-laser-deposition (PLD) technique was used to deposit bismuth-layered ferroelectrics, in particular SrBi2Ta2O9 (SBT) and SrBi2Nb2O9 (SBN) with and without dopants, on Pt/TiO2/SiO2/Si substrates. We have studied the influence of PLD process parameters and were able to orient the films along the polarization axis. The first part of this work was devoted to the optimization of PLD process parameters in order to orient the films along the (200) direction and to achieve best possible ferroelectric properties of SBT thin films for memory devices. The maximum remanent polarization for the films grown at 350°C and annealed at 750°C, was found to be about 11 μC/cm2 with a coercive field of 121 kV/cm.; The second part of this dissertation was devoted to further improvements in the remanent polarization in order to increase the charge storage density of the ferroelectric memory components. CaBi2Ta2O 9 (CBT) thin films were grown with the similar process parameters and showed inferior ferroelectric properties. The partial incorporation of Ba and Ca at Sr-site of SBT thin films was performed to understand the effect of A-site cations. The switchable component of polarization was found to increase upon partial substitution of Ca at Sr-site. A systematic substitution of Sr up to 30% Ca was conducted to understand the structural modification and compositional dependent electrical properties of SBT thin films. Incorporation of Ca at Sr-site decreased the lattice parameter and increased the grain size. The relative permitivity of the SBT thin films were systematically decreased with Ca contents and was attributed to the lower permitivity of CBT system.; We have studied the bottom electrode effect on ferroelectric properties and dc-current transport mechanism of SBT thin films. We found, Schottky conduction was dominant in SBT thin films irrespective of the bottom electrode. SBN thin films showed enhanced ferroelectric properties with remanent polarization of 25.7 μC/cm2 and coercive field of 198 kV/cm. The current-time measurements determined the predominant electronic conduction process in SBN thin films. Finally, we have used Raman spectroscopy to study the lattice vibrational modes and phase transition behavior of SBT and modified SBT compounds. The decrease in the tolerance factor of SBT compound with the incorporation of Ca at Sr-site and Nb at Ta-site showed a pronounced structural distortion in the lattice and shifted the lowest transverse optical phonon mode towards higher wavemumbers, as a result increase the transition temperatures. (Abstract shortened by UMI.)
机译:脉冲激光沉积(PLD)技术用于沉积铋层铁电体,特别是SrBi 2 Ta 2 O 9 (SBT)在Pt / TiO 2 / SiO上具有和不具有掺杂剂的SrBi 2 Nb 2 O 9 (SBN) 2 / Si衬底。我们研究了PLD工艺参数的影响,并能够使薄膜沿偏振轴取向。这项工作的第一部分致力于优化PLD工艺参数,以使膜沿(200)方向取向,并实现用于存储器件的SBT薄膜的最佳铁电性能。发现在350℃下生长并在750℃下退火的膜的最大剩余极化为约11μC/ cm 2 ,矫顽场为121kV / cm。本论文的第二部分致力于剩余极化的进一步改进,以增加铁电存储元件的电荷存储密度。以相似的工艺参数生长CaBi 2 Ta 2 O 9 (CBT)薄膜,并显示出较差的铁电性能。进行SBT薄膜Sr部位Ba和Ca的部分掺入以了解A部位阳离子的作用。发现极化的可转换成分随着在Sr位置上部分取代Ca而增加。系统地替代了高达30%Ca的Sr,以了解SBT薄膜的结构改性和与组成有关的电性能。在Sr部位掺入Ca会降低晶格参数并增加晶粒尺寸。 SBT薄膜的相对介电常数随Ca含量的增加而有系统地降低,这归因于CBT体系介电常数的降低。我们研究了底部电极对SBT薄膜的铁电性能和直流电流传输机理的影响。我们发现,不管底部电极如何,肖特基传导在SBT薄膜中占主导地位。 SBN薄膜具有增强的铁电性能,剩余极化率为25.7μC/ cm 2 ,矫顽场为198 kV / cm。当前时间的测量确定了SBN薄膜中主要的电子传导过程。最后,我们使用拉曼光谱研究了SBT和改性SBT化合物的晶格振动模式和相变行为。在Sr位点掺入Ca和在Ta位点掺入Nb会使SBT化合物的耐受因子降低,表明晶格中出现明显的结构变形,并使最低的横向光子声子模向较高的波成员移动,结果增加了跃迁温度。 (摘要由UMI缩短。)

著录项

  • 作者

    Das, Rasmi Ranjan.;

  • 作者单位

    University of Puerto Rico, Rio Piedras (Puerto Rico).;

  • 授予单位 University of Puerto Rico, Rio Piedras (Puerto Rico).;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2003
  • 页码 219 p.
  • 总页数 219
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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