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A Novel Layout-Based Single Event Transient Injection Approach to Evaluate the Soft Error Rate of Large Combinational Circuits in Complimentary Metal-Oxide-Semiconductor Bulk Technology

机译:一种基于布局的单事件瞬态注入新方法,用于评估大型金属氧化物半导体散装技术中大型组合电路的软错误率

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摘要

As the technology scales down, space radiation induced soft errors are becoming a critical issue for the reliability of Integrated Circuits (ICs). In this paper, we propose a novel layout-based Single-Event Transient (SET) injection approach to evaluate the Soft Error Rate (SER) of large combinational circuits in Complementary Metal-Oxide-Semiconductor (CMOS) bulk technology. We consider the effect of ion strike location on the SET pulse width in this approach. Heavy-ion experiments on two different inverter chains are conducted to verify this layout-based SET injection approach. The simulation and experiment results show that this approach can fairly reflect the SET pulse width distribution. Furthermore, we compare the soft error number calculated by our proposed layout-based approach with the normal SET injection approach, and illustrate the detailed circuit response obtained by our proposed approach.
机译:随着技术的缩减,空间辐射引起的软错误正成为集成电路(IC)可靠性的关键问题。在本文中,我们提出了一种新颖的基于布局的单事件瞬态(SET)注入方法,以评估互补金属氧化物半导体(CMOS)批量技术中大型组合电路的软错误率(SER)。在这种方法中,我们考虑了离子撞击位置对SET脉冲宽度的影响。在两个不同的逆变器链上进行了重离子实验,以验证这种基于布局的SET注入方法。仿真和实验结果表明,该方法可以较好地反映SET脉冲宽度分布。此外,我们将通过我们提出的基于布局的方法计算出的软错误数与常规SET注入方法进行了比较,并说明了通过我们提出的方法获得的详细电路响应。

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