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The p/sup -/ layer punch-through structure with a thick, high concentration p emitter for a light-triggered thyristor

机译:p / sup-/层穿通结构,带有厚的高浓度p发射极,用于光触发晶闸管

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The on-state voltage reduction of a light-triggered thyristor was studied from the view-points of reducing the thyristor thickness and using a high-injection, low-lifetime structure. High-injection was achieved by increasing the thickness and concentration of the p emitter. The reduction in thyristor thickness was achieved by using a p/sup -/ layer punch-through structure in both the p base and p emitter. This structure consists of a shallow, high-concentration p layer and a deep, low-concentration p layer. The depletion layer extends through the low-concentration p layer, and it reaches and is stopped by the high-concentration p layer when a high voltage is applied. This structure reduces the thickness by about 5%. The on-state voltage can be reduced for a 6-kV, 5.5-kA light-triggered thyristor by the p/sup -/ layer punch-through structure and the thick, high-concentration region of the p emitter.
机译:从减小晶闸管厚度和使用高注入,低寿命结构的角度研究了光触发晶闸管的导通电压降低。通过增加p发射极的厚度和浓度来实现高注入。晶闸管厚度的减小是通过在p基极和p发射极中使用p / sup-/层穿通结构实现的。该结构由浅的高浓度p层和深的低浓度p层组成。耗尽层延伸穿过低浓度p层,并且当施加高电压时,它到达高浓度p层并被其停止。这种结构使厚度减小了约5%。通过p / sup- /层穿通结构和p发射极的厚高浓度区域,可以降低6 kV,5.5 kA光触发晶闸管的导通电压。

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