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Fully Integrated Buck Converter With Fourth-Order Low-Pass Filter

机译:具有四阶低通滤波器的全集成降压转换器

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摘要

Fully integrated buck converters are typically operated with a second-order LC low-pass filter and a switching frequency beyond 100 MHz. The motivation for such design choices is to reduce the size of passive components in the LC low-pass filter required for small output voltage ripple. However, in a buck converter with on-chip planar spiral inductors, a fourth-order filter can deliver better performance characteristics without area penalty. This paper presents a comparative study of a fourth-order LC low-pass filter versus a second-order LC low-pass filter with on-chip planar spiral inductors and on-chip capacitors. A fully integrated buck converter is then designed with a quasi-V2 controller to demonstrate the benefits of a fourth-order LC low-pass filter. The prototype chip, which is implemented in a 65-nm CMOS process, produces a nominal voltage of 0.7 V from a 1-V supply. The fourth-order LC low-pass filter uses a total inductance of 1.8 nH and a total capacitance of 4 nF. Measurement results demonstrate fast transient response on the order of nanoseconds. A peak efficiency of 76.1% is achieved, and the output voltage ripple is kept below 15 mV over the entire range of load current from 40 to 180 mA.
机译:完全集成的降压转换器通常使用二阶LC低通滤波器和超过100 MHz的开关频率工作。选择这种设计的动机是为了减小输出低电压纹波所需的LC低通滤波器中无源元件的尺寸。但是,在具有片上平面螺旋电感器的降压转换器中,四阶滤波器可以提供更好的性能,而不会造成面积损失。本文介绍了具有片上平面螺旋电感器和片上电容器的四阶LC低通滤波器与二阶LC低通滤波器的比较研究。然后,使用准V2控制器设计一个完全集成的降压转换器,以演示四阶LC低通滤波器的优势。该原型芯片采用65纳米CMOS工艺实现,可通过1 V电源产生0.7 V的标称电压。四阶LC低通滤波器使用的总电感为1.8 nH,总电容为4 nF。测量结果表明,快速瞬态响应约为纳秒级。达到76.1%的峰值效率,并且在40至180 mA的整个负载电流范围内,输出电压纹波均保持在15 mV以下。

著录项

  • 来源
    《IEEE Transactions on Power Electronics》 |2017年第5期|3700-3707|共8页
  • 作者单位

    Electrical Engineering and Computer Science Department, Washington State University, Pullman, WA, USA;

    Electrical Engineering and Computer Science Department, Washington State University, Pullman, WA, USA;

    Department of Electrical and Computer Engineering, University of British Columbia, Vancouver, BC, Canada;

    Department of Electrical and Computer Engineering, University of British Columbia, Vancouver, BC, Canada;

    Research Department of HiSilicon, Huawei, Shenzhen, China;

    Research Department of HiSilicon, Huawei, Plano, TX, USA;

    Korea Food Research Institute, Sungnam, Korea;

    Electrical Engineering and Computer Science Department, Washington State University, Pullman, WA, USA;

    Electrical Engineering and Computer Science Department, Washington State University, Pullman, WA, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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