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Advanced qualification techniques [microelectronics]

机译:先进的认证技术[微电子学]

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摘要

This paper demonstrates use of the Qualified Manufacturers List (QML) methodology to qualify commercial and military microelectronics for use in space applications. QML "builds in" the hardness of the product through statistical process control (SPC) of technology parameters relevant to the radiation response, test structure to integrated circuit (IC) correlations, and techniques for extrapolating laboratory test results to low-dose-rate space scenarios. Each of these elements is demonstrated and shown to be a cost-effective alternative to expensive end-of-line IC testing. Several examples of test structure-to-IC correlations are provided and recent work on complications arising from transistor scaling and geometry is discussed. The use of a 10-keV X-ray wafer-level test system to support SPC and establish "process capability" is illustrated and a comparison of 10-keV X-ray and Co/sup 60/ gamma irradiations is provided for a wide range of CMOS technologies. The X-ray tester is shown to be cost-effective and its use in lot acceptance/qualification is recommended. Finally, a comparison is provided between MIL-STD-883, Test Method 1019.4, which governs the testing of packaged semiconductor microcircuits in the DoD, and ESA/SCC Basic Specification No. 22900, Europe's Total Dose Steady-State Irradiation Test Method. Test Method 1019.4 focuses on conservative estimates of MOS hardness for space and tactical applications, while Basic Specification 22900 focuses on improved simulation of low-dose-rate space environments.
机译:本文演示了合格制造商清单(QML)方法的使用,以使商用和军用微电子产品有资格用于太空应用。 QML通过与辐射响应相关的技术参数的统计过程控制(SPC),测试结构与集成电路(IC)的相关性以及将实验室测试结果外推到低剂量率空间的技术来“增强”产品的硬度场景。这些要素中的每一个都得到了证明,并显示出是昂贵的线路末端IC测试的一种经济有效的替代方案。提供了一些测试结构与IC相关性的示例,并讨论了有关晶体管缩放和几何尺寸引起的复杂性的最新工作。说明了如何使用10keV X射线晶圆级测试系统支持SPC并建立“工艺能力”,并提供了10keV X射线与Co / sup 60 /γ射线的比较CMOS技术。 X射线测试仪经证明具有成本效益,建议在批量验收/鉴定中使用。最后,比较了用于控制DoD中封装的半导体微电路测试的MIL-STD-883测试方法1019.4和欧洲总剂量稳态辐射测试方法ESA / SCC基本规范22900。测试方法1019.4着重于太空和战术应用的MOS硬度的保守估计,而基本规范22900着重于改进低剂量率太空环境的仿真。

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