Spectroscopic Diagnostics to Support Advanced Microelectronic Fabrication Techniques

摘要

This is the first annual report on a program to develop laser spectroscopic diagnostics for detection of gas phase species important in fabrication processes for advanced semiconductor materials. It has two objectives, to obtain quantitative spectroscopic data for these molecules, and to apply diagnostics to model fabrication systems. This report summarizes progress in the areas of investigation identified in the first year: chlorine atom detection using an infrared tunable diode laser, which will also be used to instrument a plasma etching reactor, and infrared and laser induced fluorescence spectroscopic studies of SiF2, CF2, and SiH2.