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首页> 外文期刊>Nanotechnology, IEEE Transactions on >Observation of Ga Metal Droplet Formation on Photolithographically Patterned GaAs (100) Surface by Droplet Epitaxy
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Observation of Ga Metal Droplet Formation on Photolithographically Patterned GaAs (100) Surface by Droplet Epitaxy

机译:通过液滴外延观察在光刻图案化的GaAs(100)表面上的Ga金属液滴形成

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摘要

A sharp contrast on the density and size of Ga metal droplets is observed on various photolithographically patterned GaAs (100). As clearly evidenced by high-resolution scanning electron microscope, Ga metal droplet density and size surprisingly differ on etched and unetched surfaces under an identical growth condition. The apparent contrast on the density and size of droplets is clearly observed at the interface between etched and unetched areas. Ga droplets exhibit much higher density and the size is much smaller on etched surface; meanwhile, the density is an order of magnitude lower and the size is much larger on unetched surface. Along different directions, [011] and [01-1], due to anisotropic surface diffusion, the density is about twice higher along [011] for the same strip pattern.
机译:在各种光刻图案化的GaAs(100)上观察到Ga金属滴的密度和大小的鲜明对比。如高分辨率扫描电子显微镜清楚地证明的,在相同的生长条件下,Ga金属液滴的密度和大小出乎意料地在蚀刻和未蚀刻的表面上不同。在蚀刻区域和未蚀刻区域之间的界面上可以清楚地观察到液滴密度和大小的明显对比。 Ga液滴的密度高得多,而蚀刻后的表面的尺寸小得多。同时,未蚀刻表面上的密度低一个数量级,尺寸大得多。沿着不同的方向[011]和[01-1],由于各向异性的表面扩散,对于相同的带状图案,密度沿着[011]大约高两倍。

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