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Nondestructive Current Localization Upon High-Current Nanosecond Switching of an Avalanche Transistor

机译:雪崩晶体管高电流纳秒切换时的无损电流定位

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Very good quantitative agreement was found between the experimental and simulated switching transients of a Si avalanche transistor at extreme currents. Two-dimensional (2-D) simulations were performed using the device simulator ATLAS (Silvaco Inc.)- Marked current localization was found, which was of a nondestructive character with nanosecond current pulses due to a very significant reduction in the residual voltage across the transistor at high current densities and specific location of the region of intensive heat generation. The device operates reliably at a sufficiently low repetition rate (of a few kilohertz) despite the very high local temperature (~750° K) found near the n{sup}+ collector at the end of the switching transient.
机译:在极端电流下,Si雪崩晶体管的实验和模拟开关瞬态之间发现了非常好的定量一致性。使用设备仿真器ATLAS(Silvaco Inc.)进行了二维(2-D)仿真-发现了明显的电流定位,该电流定位具有无损特性,纳秒电流脉冲的产生是由于跨过传感器的剩余电压大大降低了晶体管在高电流密度和高热量产生区域的特定位置。尽管在开关瞬态结束时在n {sup} +集电极附近发现了非常高的局部温度(〜750°K),但该设备仍以足够低的重复频率(几千赫兹)可靠地工作。

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