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Theoretical Foundation for Upsets in CMOS Circuits Due to High-Power Electromagnetic Interference

机译:大功率电磁干扰导致CMOS电路失常的理论基础

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The performance and reliability of CMOS integrated circuits are severely affected by high-power electromagnetic interference (EMI), resulting in serious operational upsets, critical bit errors, and reversible or irreversible failures. Based on experimental evidence from individual MOSFETs and CMOS cascaded inverters, the fundamental causes for such upsets are examined, and a new theoretical foundation based on excess charge effects and the nonlinear continuity equation for high level injection is developed. A new modified drain current MOSFET equation that includes the effects of EMI is proposed. The key experimental evidence that leads to the development of the theory and the validation of the theory are discussed. Comparisons between the experimental and calculated results based on the modified equation were found to be in excellent agreement. The modified MOSFET equation can now be used in the design, modeling, and simulation of CMOS ICs to predict vulnerabilities and to improve reliability and performance of CMOS electronic systems operating in critical and adverse environments.
机译:CMOS集成电路的性能和可靠性受到高功率电磁干扰(EMI)的严重影响,从而导致严重的工作失常,严重的位错误以及可逆或不可逆故障。基于来自各个MOSFET和CMOS级联逆变器的实验证据,研究了造成这种扰动的根本原因,并基于过量电荷效应和高电平注入的非线性连续性方程建立了新的理论基础。提出了一种新的改进的漏极电流MOSFET方程,其中包括EMI的影响。讨论了导致理论发展和理论验证的关键实验证据。发现基于改进方程的实验结果与计算结果之间的比较非常吻合。修改后的MOSFET方程现在可用于CMOS IC的设计,建模和仿真,以预测漏洞并提高在关键和不利环境中运行的CMOS电子系统的可靠性和性能。

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