首页> 外文期刊>IEEE transactions on device and materials reliability >Effects of Extreme Temperature Swings ( $-hbox{55} ^{circ}hbox{C}$ to 250 $^{circ}hbox{C}$) on Silicon Nitride Active Metal Brazing Substrates
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Effects of Extreme Temperature Swings ( $-hbox{55} ^{circ}hbox{C}$ to 250 $^{circ}hbox{C}$) on Silicon Nitride Active Metal Brazing Substrates

机译:极端温度波动($ -hbox {55} ^ {circ} hbox {C} $至250 $ ^ {circ} hbox {C} $)对氮化硅活性金属钎焊衬底的影响

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Reliability of power electronic substrates has been one of the main issues of high-temperature packaging technologies. Widely used direct bonded copper (DBC) substrates, if subjected to wide temperature swings, suffer from copper layers peeling off from a ceramic because of the large thermal stresses resulting from the difference in coefficient of thermal expansion (CTE) between the copper and the ceramic (e.g., $hbox{Al}_{2}hbox{O}_{3}$ or AlN). Recently, silicon nitride active metal brazing ( $hbox{Si}_{3}hbox{N}_{4}$-AMB) substrate has been developed with the aim to utilize power electronic substrates for extreme environmental conditions. $hbox{Si}_{3}hbox{N}_{4}$-AMB has superior reliability because of the high mechanical strength of $hbox{Si}_{3}hbox{N}_{4}$. In this paper, the effects of extreme temperature swings ( $-hbox{55} ^{circ}hbox{C}$ to 250 $^{circ}hbox{C}$) on $hbox{Si}_{3}hbox{N}_{4}$-AMB substrates were investigated to evaluate their applicability to harsh environment. Their high resistance to the peeling off of copper layers was confirmed. However, the surface-roughening phenomenon was observed on the surface of copper layers after the temperature cycling test. The mechanism of surface roughening was analyzed. It was found that the out-of-plane displacement of single grains, which is called the orange-peel phenomenon, occurred on the surface of the copper layers.
机译:功率电子基板的可靠性一直是高温封装技术的主要问题之一。广泛使用的直接键合铜(DBC)基板如果经受较大的温度波动,则由于铜和陶瓷之间的热膨胀系数(CTE)差异而产生的巨大热应力会导致铜层从陶瓷上剥离。 (例如,$ hbox {Al} _ {2} hbox {O} _ {3} $或AlN)。近来,已经开发出氮化硅活性金属钎焊($ hbox {Si} _ {3} hbox {N} _ {4} $-AMB)衬底,其目的是在极端的环境条件下利用功率电子衬底。 $ hbox {Si} _ {3} hbox {N} _ {4} $-AMB具有卓越的可靠性,因为$ hbox {Si} _ {3} hbox {N} _ {4} $具有很高的机械强度。在本文中,极端温度波动的影响($ -hbox {55} ^ {circ} hbox {C} $到250 $ ^ {circ} hbox {C} $)对$ hbox {Si} _ {3} hbox的影响研究了{N} _ {4} $-AMB基材,以评估其在恶劣环境下的适用性。证实了它们对铜层剥离的高抵抗力。然而,在温度循环试验之后,在铜层的表面上观察到了表面粗糙化现象。分析了表面粗糙化的机理。发现在铜层的表面上发生了单晶粒的面外位移,这称为橙皮现象。

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